NVIDIA cuLitho

Accelerate computational lithography

NVIDIA cuLitho is a library with optimized tools and algorithms for GPU-accelerating computational lithography and the manufacturing process of semiconductors by orders of magnitude over current CPU-based methods.

Manufacturing computer chips requires a critical step called computational lithography – a complex computation – involving electromagnetic physics, photochemistry, computational geometry, iterative optimization, and distributed computing.

This computational lithography step is already one of the largest compute workloads in semiconductor production, necessitating massive data centers, and the silicon miniaturization evolution process exponentially amplifies the computation requirements over time.

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The Challenge

As silicon feature sizes become smaller, and the impacts of optical diffraction have to be offset, there arises a need to proactively manipulate mask patterns with optical proximity correction (OPC) or inverse lithography technology (ILT) to accurately image wafers. This requires advanced computational lithography techniques and increased compute efficiency. Every industry needs to accelerate every workload, so that we can reclaim power and do more with less.

Advanced computational lithography (cuLitho) techniques for computer chips


Acceleration libraries are at the core of accelerated computing. NVIDIA cuLitho is a library that targets the emerging challenges of nanoscale computational lithography. With GPUs, it accelerates inverse lithography by 40X, helping create new solutions to make future semiconductor technologies cheaper and more predictable. It introduces new innovations and leverages decades of investment in CUDA® infrastructure.

 Improved performance from faster computational lithography ILT


Faster inverse lithography technology (ILT) powers a 40X performance speedup, generating accurate photomasks faster.

 Increased productivity with cuLitho


Photomasks that took two weeks can be processed overnight.

3X to 5X more masks can be generated per day.

 cuLitho helps with cost savings by using less data center power

Cost Savings

500 NVIDIA Hopper™ GPU systems running cuLitho can do the work of 40,000 CPU systems. That's 1/9 the power and 1/8 the space.

 New lithography innovations can support future silicon scaling

Future Silicon Scaling

Faster OPC enables new lithography innovations to address miniaturization of next-generation semiconductors, including subatomic modeling, curvilinear OPC, and high-numerical aperture extreme-ultraviolet (high-NA EUV) lithography.


Semiconductor and electronic design automation (EDA) industry leaders are leveraging NVIDIA cuLitho to drive silicon scaling and enable their end users to reduce costs and accelerate technology advancements.

Press Release

Read 2023 Press Release

NVIDIA, ASML, TSMC, and Synopsys collaborate to advance next-generation chip manufacturing by adopting NVIDIA's groundbreaking computational lithography, thereby pushing the boundaries of physics in the industry.

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Read 2024 Press Release

NVIDIA introduces Gen AI to computational lithography, and integration partners go into production with cuLitho.

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Learn More About NVIDIA cuLitho at GTC

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